Genesys-2
Electron Beam Lithography System
The Nanogrande Difference
Precision Nanoscale Fabrication
The Genesys-2 combines Nanogrande's breakthrough Fluid Bed® and state-of-the-art E-Beam Lithography technologies.
It delivers unmatched precision down to sub-10 nm resolution, dramatically reducing material waste and operational costs.
Designed specifically for advanced electronics manufacturing, photonics, cutting-edge research labs, and production facilities. The Genesys-2 ensures maximum efficiency without compromising accuracy.
95%
Reduction in Photoresist Waste
Unlike traditional systems, Genesys-2 leverages proprietary deposition techniques, significantly reducing photoresist usage, cleaning solvents, and water waste.
This boosts environmental sustainability and dramatically lowers overall production costs.
Other benefits include:
Conformal Deposition → Thickness Control → Reduced Cost
Genesys-2 Specs
Maximum build size wafers up to 200 mmφ, masks up to 6-inch
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Spot size (beam width) ≤1.9 nm
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Minimum line width <10 nm
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Minimum layer thickness down to 1 nm (photoresist deposition)
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Stage resolution: 0.6 nm
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Accelerating voltage up to 50 kV
Compatible Materials
The Genesys-2 is compatible with diverse materials, enabling versatile and precise manufacturing across various industries. Compatible materials include resins and polymers, metals and ceramics precursors, oxides, and advanced composites. Below are just a few examples.
Use Cases
Real-World Applications
The Genesys-2 supports groundbreaking applications in electronics, photonics, and nanotechnology research, empowering businesses, labs, and production facilities to achieve unparalleled precision and innovation.